フォトレジスト

Japanese

Etymology

From English photoresist.

Pronunciation
  • IPA(key): [ɸo̞to̞ɾe̞ʑisɨᵝto̞]

Noun

フォトレジスト • (fotorejisuto) 

  1. photoresist
    • 2009, Akamatsu Kiyoshi, Kankōsei jushi no ōyō gijutsu [Practical techniques for photosensitive resin], page 119:
      これらの工(こう)法(ほう)でフォトレジストは回(かい)路(ろ)形(けい)成(せい)プロセスで用(もち)いられ,通(つう)常(じょう)は加(か)工(こう)後(あと)剥(はく)離(り)されてPWB(プリントきばん)上( うえ)には残(のこ)らないプロセス材(ざい)料(りょう)である。
      Korera no kōhō de fotorejisuto wa kairo keisei purosesu de mochiirare, tsūjō wa kakō ato hakurisarete purinto-kiban ue ni wa nokoranai purosesu zairyō de aru.
      With these techniques, photoresist is used during the circuit formation process, and is usually removed after processing so that no material from the process remains on the PWB.
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